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Electromechanically Driven Chaotic Dynamics of Voids in Metallic Thin Films

机译:金属薄膜中空洞的机电驱动混沌动力学

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摘要

We report a systematic investigation of complex asymptotic states reached in the electromigration-driven morphological evolution of void surfaces in thin films of face-centered cubic metals with ⟨110⟩- and ⟨100⟩-oriented film planes under the simultaneous action of biaxial tension. The analysis is based on self-consistent dynamical simulations according to a realistic, well-validated, and fully nonlinear model. For ⟨110⟩-oriented film planes, we show that upon increasing the applied mechanical stress level, morphologically stable steady states transition to time-periodic states through a subcritical Hopf bifurcation. Further increase in the stress level triggers a sequence of period-doubling bifurcations that sets the driven nonlinear system on a route to chaos. For ⟨100⟩-oriented film planes, a transition from steady to time-periodic states also is found to occur at a critical stress level; in this case, the corresponding Hopf bifurcation is supercritical and the nonlinear system is not set on a route to chaos.
机译:我们报告了复杂的渐近状态的系统调查,该状态在以⟨110⟩-和⟨100⟩-取向的膜平面的面心立方金属薄膜中,在双轴张力的同时作用下,以电迁移驱动的空洞表面形态演化过程中达到的。该分析基于真实,有效且完全非线性的模型的自洽动态仿真。对于⟨110⟩取向的薄膜平面,我们表明,随着施加的机械应力水平的提高,形态稳定的稳态通过亚临界霍夫夫分叉转变为时间周期状态。应力水平的进一步提高会触发一系列倍增的分叉,从而使被驱动的非线性系统陷入混乱。对于⟨100⟩取向的薄膜平面,还发现在临界应力水平上也会发生从稳态到时间周期的转变。在这种情况下,相应的Hopf分支是超临界的,并且非线性系统未设置在通往混沌的路径上。

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